Broadband omnidirectional antireflection coatings optimized by genetic algorithm

被引：67

作者：

Poxson, David J. ^{[2
]}

Schubert, Martin F. ^{[1
]}

Mont, Frank W. ^{[1
]}

Schubert, E. F. ^{[1
,2
]}

Kim, Jong Kyu ^{[1
]}

机构：

[1] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA

[2] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA

来源：

OPTICS LETTERS | 2009年 / 34卷 / 06期

基金：

美国国家科学基金会;

关键词：

LOW-REFRACTIVE-INDEX; REFLECTION; DESIGN;

D O I：

10.1364/OL.34.000728

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An optimized graded-refractive-index (GRIN) antireflection. (AR) coating with broadband and omnidirectional characteristics-as desired for solar cell applications-designed by a genetic algorithm is presented. The optimized three-layer GRIN AR coating consists of a dense TiO2 and two nanoporous SiO2 layers fabricated using oblique-angle deposition. The normal incidence reflectance of the three-layer GRIN AR coating averaged between 400 and 700 nm is 3.9%, which is 37% lower than that of a conventional single-layer Si3N4 coating. Furthermore, measured reflection over the 410-740 run range and wide incident angles 40 degrees-80 degrees is reduced by 73% in comparison with the single-layer Si3N4 coating, clearly showing enhanced omnidirectionality and broadband characteristics of the optimized three-layer GRIN AR coating. (C) 2009 Optical Society of America

引用

页码：728 / 730

页数：3

共 11 条

[1] Design of optical path for wide-angle gradient-index antireflection coatings [J].

Chen, Minfeng ;

Chang, Hung-chun ;

Chang, Allan S. P. ;

Lin, Shawn-Yu ;

Xi, J.-Q. ;

Schubert, E. F. .

APPLIED OPTICS, 2007, 46 (26) :6533-6538

[2]

HECT EH, 2002, OPTICS, P429

[3] Porous broadband antireflection coating by glancing angle deposition [J].

Kennedy, SR ;

Brett, MJ .

APPLIED OPTICS, 2003, 42 (22) :4573-4579

[4]

KIM JK, 2008, J ADV MAT, V20, P801

[5] Realization of a near-perfect antireflection coating for silicon solar energy utilization [J].

Kuo, Mei-Ling ;

Poxson, David J. ;

Kim, Yong Sung ;

Mont, Frank W. ;

Kim, Long Kyu ;

Schuhert, E. Fred ;

Lin, Shawn-Yu .

OPTICS LETTERS, 2008, 33 (21) :2527-2529

[6] Toward perfect antireflection coatings. 2. Theory [J].

Poitras, D ;

Dobrowolski, JA .

APPLIED OPTICS, 2004, 43 (06) :1286-1295

[7] Quantification of porosity and deposition rate of nanoporous films grown by oblique-angle deposition [J].

Poxson, D. J. ;

Mont, F. W. ;

Schubert, M. F. ;

Kim, J. K. ;

Schubert, E. F. .

APPLIED PHYSICS LETTERS, 2008, 93 (10)

[8]

RAYLEIGH SJ, 1880, P LOND MATH SOC, V11, P51

[9] Design of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials by genetic algorithm [J].

Schubert, Martin F. ;

Mont, Frank W. ;

Chhajed, Sameer ;

Poxson, David J. ;

Kim, Jong Kyu ;

Schubert, E. Fred .

OPTICS EXPRESS, 2008, 16 (08) :5290-5298

[10] GRADIENT-INDEX ANTI-REFLECTION COATINGS [J].

SOUTHWELL, WH .

OPTICS LETTERS, 1983, 8 (11) :584-586

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