Synergistic effect of H2O and O2 on the decoupling of epitaxial monolayer graphene from SiC(0001) via thermal treatments

被引:23
作者
Bom, N. M. [1 ,2 ]
Oliveira, M. H., Jr. [1 ]
Soares, G. V. [3 ]
Radtke, C. [4 ]
Lopes, J. M. J. [1 ]
Riechert, H. [1 ]
机构
[1] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
[2] Univ Fed Rio Grande do Sul, PGMICRO, BR-91509900 Porto Alegre, RS, Brazil
[3] Univ Fed Rio Grande do Sul, Inst Fis, BR-91509900 Porto Alegre, RS, Brazil
[4] Univ Fed Rio Grande do Sul, Inst Quim, BR-91509900 Porto Alegre, RS, Brazil
关键词
SILICON-CARBIDE; BILAYER GRAPHENE; BUFFER LAYER; INTERFACE OXIDATION; WATER-VAPOR; INTERCALATION; TRANSISTORS; PRESSURE;
D O I
10.1016/j.carbon.2014.07.006
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The conversion of monolayer graphene grown epitaxially on SiC(0001) into quasi-free standing bilayer graphene (QFSBG) can be achieved by decoupling the buffer layer (BL) from the substrate via an annealing step. We investigated the role of O-2 and H2O (possible agents of this process) by varying the annealing atmosphere and time. Raman spectroscopy reveals a synergistic effect of O-2 and H2O, which promotes a complete BL detachment and thus large-area QFSBG formation. Similar results are obtained in a H2O-rich ambient for longer annealing times. X-ray photoelectron spectroscopy (XPS) revealed that in both cases the observed effect is related to the formation of an oxide layer on the SiC surface during annealing. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:298 / 304
页数:7
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