A novel acid resistant thin-film composite nanofiltration membrane with polyurea enhanced dually charged separation layer

被引:16
|
作者
Cao, Yang [1 ,2 ]
Wan, Yinhua [1 ,2 ,3 ]
Chen, Chulong [4 ]
Luo, Jianquan [1 ,2 ]
机构
[1] Chinese Acad Sci, Inst Proc Engn, State Key Lab Biochem Engn, Beijing 100190, Peoples R China
[2] Univ Chinese Acad Sci, Sch Chem Engn, Beijing 100190, Peoples R China
[3] Chinese Acad Sci, Ganjiang Innovat Acad, Ganzhou 341000, Peoples R China
[4] ZheJiang MEY Membrane Technol CO LTD, Hangzhou 310404, Peoples R China
来源
JOURNAL OF MEMBRANE SCIENCE LETTERS | 2021年 / 1卷 / 01期
关键词
Thin-film composite membrane; Reverse interfacial polymerization; Poly(amide-sulfonamide); Acid-resistant membrane; Wastewater treatment; INTERFACIAL POLYMERIZATION; NAPHTHALENE-1,3,6-TRISULFONYLCHLORIDE NTSC; PH; POLYSULFONAMIDE; CHLORIDE; SALT;
D O I
10.1016/j.memlet.2021.100002
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Fabricating acid resistant nanofiltration (NF) membranes with precise solute separation performance is highly demanded for acidic wastewater treatment but remains a challenge. Herein, we propose a facile strategy for preparing dually charged acid resistant NF membranes with both high cations and anions rejections via a twolayer reverse interfacial polymerization (r-IP) process. Organic monomers of trimesoyl chloride (TMC) and 1,4phenylene diisocyanate (PPDI) are firstly applied to react with 3-aminobenzenesulfonamide (ABSA) to construct a negatively charged loose intermediate layer, followed by the r-IP of TMC/PPDI and polyethyleneimine (PEI) to engineer a dense positively charged top layer. The highly cross-linked polyurea (PU) formed by isocyanate and amine leads to an enhanced size sieving effect, and the well-arranged dually charged layer endows the membrane stronger electrostatic exclusion. The resultant membrane has 97.7% rejection of Na 2 SO 4 and 93.0% of MgCl 2 , and it exhibits fairly high rejections to various heavy metals, as well as impressive long-term stability after exposure to strong acid (10 wt% of H 2 SO 4 for 400 h).
引用
收藏
页数:6
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