Advanced No-Field-Plate AlGaN/GaN HEMTs for Millimeter-Wave MMIC Applications

被引:0
|
作者
Xu, Dong [1 ]
Chu, K. K. [1 ]
Diaz, J. A. [1 ]
Pleasant, L. Mt. [1 ]
Lender, R. [1 ]
Schmanski, B. [1 ]
Ashman, M. [1 ]
Hulse, J. [1 ]
Gerlach, M. [1 ]
Zhu, Wenhua [1 ]
Seekell, P. [1 ]
Schlesinger, L. [1 ]
Isaak, R. [1 ]
Nichols, K. [1 ]
Komiak, J. J. [1 ]
Yang, X. P. [1 ]
Duh, K. H. G. [1 ]
Smith, P. M. [1 ]
Chao, P. C. [1 ]
机构
[1] BAE Syst, Microelect Ctr, Elect Syst, Nashua, NH 03061 USA
关键词
high electron mobility transistor; HEMT; gallium nitride; GaN; monolithic microwave integrated circuit; MMIC; millimeter-wave; MMW; power amplifier; wideband; Ka band;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report successful development of an advanced no-field-plate AlGaN/GaN high electron mobility transistors (HEMTs) for millimeter-wave (MMW) applications. The HEMT adopts a reduced source-drain spacing of 2 mu m and the 0.2- mu m gate is placed 0.5 mu m off the source electrode. Additionally, the devices and monolithic microwave integrated circuits (MMICs) are fabricated on the SiC substrate of 2mil, enabling the fabrication of 15 mu m x 25 mu m slot via holes for realizing low inductance and more compact devices to facilitate MMW MMIC design. As a result, the narrow band MMICs have achieved an output power of 10.4 W with associated power added efficiency (PAE) of 31% at 28 GHz, and 10.7W and 27% at 36 GHz, respectively. Besides, a state-of-the-art 2-stage single-ended wideband MMIC demonstrates output power of 5-7.9 Wand associated PAE of 13-21% from low K-band to high Ka-band.
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页数:3
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