Study of the optical properties and structure of ZnSe/ZnO thin films grown by MOCVD with varying thicknesses

被引:13
作者
Jabri, S. [1 ]
Amiri, G. [2 ]
Sallet, V. [2 ]
Souissi, A. [3 ]
Meftah, A. [1 ]
Galtier, P. [2 ]
Oueslati, M. [1 ]
机构
[1] Fac Sci Tunis, Unite Nanomat & Photon, Campus Univ Ferhat Hachad, Tunis 2092, Tunisia
[2] Univ Paris Saclay, CNRS Univ Versailles St Quentin, Grp Etud Mat Condensee, 45 Ave Etats Unis, F-78035 Versailles, France
[3] Ctr Rech & Technol Energie, Lab Photovolta, BP 95, Hammammlif 2050, Tunisia
关键词
ZnSe; ZnO; DRX; Photoluminescence; Raman polarization; Phonon; LUMINESCENCE; EXCITON;
D O I
10.1016/j.physb.2016.02.025
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
ZnSe layers were grown on ZnO substrates by the metal organic chemical vapor deposition technique. A new structure appeared at lower thicknesses films. The structural properties of the thin films were studied by the X-ray diffraction (XRD) and Raman spectroscopy methods. First, Raman selection rules are explicitly put forward from a theoretical viewpoint. Second, experimentally-retrieved-intensities of the Raman signal as a function of polarization angle of incident light are fitted to the obtained theoretical dependencies in order to confirm the crystallographic planes of zinc blend ZnSe thin film, and correlate with DRX measurements. Raman spectroscopy has been used to characterize the interfacial disorder that affects energy transport phenomena at ZnSe/ZnO interfaces and the Photoluminescence (PL) near the band edge of ZnSe thin films. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:93 / 98
页数:6
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