An accurate locally active memristor model for S-type negative differential resistance in NbOx

被引:161
作者
Gibson, Gary A. [1 ]
Musunuru, Srinitya [1 ]
Zhang, Jiaming [1 ]
Vandenberghe, Ken [2 ]
Lee, James [1 ]
Hsieh, Cheng-Chih [1 ]
Jackson, Warren [1 ]
Jeon, Yoocharn [1 ]
Henze, Dick [1 ]
Li, Zhiyong [1 ]
Williams, R. Stanley [1 ]
机构
[1] Hewlett Packard Labs, 1501 Page Mill Rd, Palo Alto, CA 94304 USA
[2] Hewlett Packard Corp, PTD PPS, 1070 NE Circle Blvd, Corvallis, OR 97330 USA
关键词
POOLE-FRENKEL; THIN-FILMS; SWITCHING PHENOMENA; VANADIUM DIOXIDE; OXIDE FILMS; CONDUCTION; SCHOTTKY; DEVICES; INSULATORS; JUNCTIONS;
D O I
10.1063/1.4939913
中图分类号
O59 [应用物理学];
学科分类号
摘要
A number of important commercial applications would benefit from the introduction of easily manufactured devices that exhibit current-controlled, or "S-type," negative differential resistance (NDR). A leading example is emerging non-volatile memory based on crossbar array architectures. Due to the inherently linear current vs. voltage characteristics of candidate non-volatile memristor memory elements, individual memory cells in these crossbar arrays can be addressed only if a highly non-linear circuit element, termed a " selector," is incorporated in the cell. Selectors based on a layer of niobium oxide sandwiched between two electrodes have been investigated by a number of groups because the NDR they exhibit provides a promisingly large non-linearity. We have developed a highly accurate compact dynamical model for their electrical conduction that shows that the NDR in these devices results from a thermal feedback mechanism. A series of electrothermal measurements and numerical simulations corroborate this model. These results reveal that the leakage currents can be minimized by thermally isolating the selector or by incorporating materials with larger activation energies for electron motion. (C) 2016 Author(s).
引用
收藏
页数:5
相关论文
共 48 条
[1]   Meyer-Neldel rule and Poole-Frenkel effect in chalcogenide glasses [J].
Abdel-Wahab, F. ;
Yelon, A. .
JOURNAL OF APPLIED PHYSICS, 2013, 114 (02)
[2]   THRESHOLD SWITCHING IN CHALCOGENIDE-GLASS THIN-FILMS [J].
ADLER, D ;
SHUR, MS ;
SILVER, M ;
OVSHINSKY, SR .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3289-3309
[3]   Current-controlled negative differential resistance due to Joule heating in TiO2 [J].
Alexandrov, A. S. ;
Bratkovsky, A. M. ;
Bridle, B. ;
Savel'ev, S. E. ;
Strukov, D. B. ;
Williams, R. Stanley .
APPLIED PHYSICS LETTERS, 2011, 99 (20)
[4]   SWITCHING PHENOMENA IN TITANIUM OXIDE THIN FILMS [J].
ARGALL, F .
SOLID-STATE ELECTRONICS, 1968, 11 (05) :535-&
[5]   Nonlinear Dynamics of a Locally-Active Memristor [J].
Ascoli, Alon ;
Slesazeck, Stefan ;
Maehne, Hannes ;
Tetzlaff, Ronald ;
Mikolajick, Thomas .
IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS, 2015, 62 (04) :1165-1174
[6]   THERMAL FILAMENTS IN VANADIUM DIOXIDE [J].
BERGLUND, CN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (05) :432-+
[7]   Spatial variation of the work function in nano-crystalline TiN films measured by dual-mode scanning tunneling microscopy [J].
Bolotov, Leonid ;
Fukuda, Koichi ;
Tada, Tetsuya ;
Matsukawa, Takashi ;
Masahara, Meishoku .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (04)
[8]   Access devices for 3D crosspoint memory [J].
Burr, Geoffrey W. ;
Shenoy, Rohit S. ;
Virwani, Kumar ;
Narayanan, Pritish ;
Padilla, Alvaro ;
Kurdi, Buelent ;
Hwang, Hyunsang .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2014, 32 (04)
[9]   CURRENT-CONTROLLED NEGATIVE RESISTANCE IN THIN NIOBIUM OXIDE FILMS [J].
CHOPRA, KL .
PROCEEDINGS OF THE IEEE, 1963, 51 (06) :941-&
[10]   AVALANCHE-INDUCED NEGATIVE RESISTANCE IN THIN OXIDE FILMS [J].
CHOPRA, KL .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) :184-&