EFFECT OF RF-SPUTTERING POWER ON PLASMA PARAMETERS AND OPTICAL PROPERTIES OF TiN COATING

The TiN surface layer depostion by RF- sputtering of Titanium sheet and N2 gas has been proposed two modification Ti6Al4V alloy under the different power of the experimental 50, 100, 150 and 200 watts which is used on the implant bone. The TiN layer is very important for surface modification, according to the diagnosis of these materials through the first spectroscopy which is appear different coulors TiN layer with increase of thickness at different power , cross section FESEM and EDS. the results display the materials peaks comparing with the protective TiN standard andthe spectral absorption and transmission of different power for Ti multi-layer and shows the wavelength of absorption and transmission with range (330- 340 nm), depending on the different count capacity and pure titanium attendance is less peak in less energy and the peak is greater than after the power is greater in (100, 150 and 200)Watt . The microstructural of FIB images display that the coating interlayer is completely bonded to the substrate coating interface and by EDX presented that the coating contains a TiN phase consisting of the coated Ti-6Al-4V surface, as predicted. When RF- sputtering power and RF-sputtering Vbi are increased, resulted in denser surfaces.