Bottom-Up Assembly of Molecular Nanostructures by Means of Ferroelectric Lithography

被引:8
作者
Haussmann, Alexander [1 ]
Gemeinhardt, Andre
Schroeder, Mathias
Kaempfe, Thomas
Eng, Lukas M.
机构
[1] Tech Univ Dresden, Inst Angew Phys, D-01062 Dresden, Germany
关键词
PHOTOCHEMICAL REDUCTION; LOCAL REACTIVITY; POLARIZATION; SURFACES; NANOWIRES; FIELD;
D O I
10.1021/acs.langmuir.6b03405
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Here, we report on the.photochemical,deposi, tion of Rhodamine 6G (Rh6G) and Alexa647 molecules from aqueous and methanolic solution along 180 degrees ferroelectric (FE) domain walls (DWs) of z-cut lithium niobate (LNO) single crystals. Molecules and FE domains were investigated by means of dynamic-mode AFM, piezoresponse force microscopy (PFM), and confocal scanning-fluorescence microscopy. A high deposition affinity for 180 DWs on the LNO surface is observed, leading to the formation of molecular nanowires. Additionally, a more complex depoSition pattern for Rh6G adsorbed to the domain areas of freshly poled-samples was equally observed, being associated with the DW dynamics. These results are explained by considering contributions from screening-charge-dependent photochemistry as confined to the DWs, UV-induced DW motion, and transient electrostatic fields arising from the metastable defect diStribution shortly after poling. Hence, tuning these effects offers the possibility for accurately controlling the complex bottom-up assembly of functional, molecular nanostructures through domain-structured ferroelectric templates.
引用
收藏
页码:475 / 484
页数:10
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