Custom-modified three-dimensional periodic microstructures by pattern-integrated interference lithography

被引：8

作者：

Leibovici, Matthieu C. R. ^{[1
]}

Gaylord, Thomas K. ^{[1
]}

机构：

[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION | 2014年 / 31卷 / 07期

基金：

美国国家科学基金会;

关键词：

PHOTONIC CRYSTAL TEMPLATES; NONCOPLANAR BEAMS; FABRICATION; HOLOGRAPHY; CRYSTALLOGRAPHY; INVERSION; LATTICES;

D O I：

10.1364/JOSAA.31.001515

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

By combining interference lithography and projection photolithography concurrently, pattern-integrated interference lithography (PIIL) enables the wafer-scale, rapid, and single-exposure fabrication of multidimensional periodic microstructures that integrate arbitrary functional elements. To date, two-dimensional PIIL has been simulated and experimentally demonstrated. In this paper, we report new simulated results of PIIL exposures for various custom-modified three-dimensional (3D) periodic structures. These results were generated using custom PIIL comprehensive vector modeling. Simulations include mask-integrated and mask-shaped 3D periodic arrangements as well as microcavities on top of or fully embedded within 3D periodic structures. These results indicate PIIL is a viable method for making versatile 3D periodic microstructures. (C) 2014 Optical Society of America

引用

页码：1515 / 1519

页数：5

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