A Unified Quasi-3D Subthreshold Behavior Model for Multiple-Gate MOSFETs

被引:5
作者
Liou, Juin J. [1 ]
Gao, Hong-Wun [2 ]
Wang, Yeong-Her [2 ]
Chiang, Te-Kuang [3 ]
机构
[1] North Minzu Univ, Sch Elect & Informat Engn, Yinchuan 750021, Peoples R China
[2] Natl Cheng Kung Univ, Inst Microelect, Tainan 701, Taiwan
[3] Natl Univ Kaohsiung, Dept Elect Engn, Adv Devices Simulat Lab, Kaohsiung 811, Taiwan
关键词
Quasi-3D potential approach; quadruple-gate MOSFET; effective scaling length; effective channel width; effective channel height; subthreshold resistance; short-channel effects; subthreshold behavior; multiple-gate MOSFET; JUNCTIONLESS MOSFETS; SCALING THEORY; CIRCUITS; SILICON; VOLTAGE; FIELD;
D O I
10.1109/TNANO.2018.2831718
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Based on the quasi-3D potential approach, a unified subthreshold-potential, threshold-voltage, and subthresholdcurrent model is developed for multiple-gate MOSFETs including a quadruple-gate, triple-gate, and omega-gate MOSFET. Thiswork indicates that the scaling-length-oriented subthreshold current rollup Delta I-sub and threshold voltage roll-off Delta V-th provide the physical insight into well-controlled short-channel effects (SCEs) in terms of effective scaling length lambda(eff) according to the scaling factor. Besides the decreased minimum conducting channel potential Phi(C, min), the smaller scaling-length-induced effective channel width/height (W-eff /H-eff) reflects the smaller effective conducting cross-sectional area, which reduces the subthreshold current degradation due to the increased subthreshold resistance R-sub. By accounting for the coupling factor in the quasi-3D potential approach, W-eff, H-eff, and Phi(C, min) will be increased to some extent to decrease R-sub, which, hence, degrades the subthreshold behavior more extensively in response to SCEs.
引用
收藏
页码:763 / 771
页数:9
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