In situ TEM observation of nucleation and growth of spherical graphitic clusters under ion implantation

被引:4
作者
Abe, H [1 ]
Yamamoto, S [1 ]
Miyashita, A [1 ]
机构
[1] Japan Atom Energy Res Inst, Gunma 3701292, Japan
来源
JOURNAL OF ELECTRON MICROSCOPY | 2002年 / 51卷
关键词
electron microscopy; graphite; in situ; ion implantation; carbon onion; nanocapsule;
D O I
10.1093/jmicro/51.Supplement.S183
中图分类号
TH742 [显微镜];
学科分类号
摘要
implantation with 100 keV C+ ions in a transmission electron microscope (TEM) was performed in copper at temperatures from 570 to 970 K to reveal the agglomeration process of implanted species immiscible in the substrates. Phase and strain contrast features with diameters of similar to5 nm appeared in Cu TEM samples at a fluence of 1 X 10(17) C/cm(2), at which carbon concentration and radiation damage were roughly evaluated as 10 at% and four displacements per carbon atom, respectively. The features were determined as carbon onions due to their spherical morphology and concentric graphene shells with the interlayer distance of bulk graphite. The strain contrast around onions indicated that they were embedded in the substrate enhancing isotropic strain. We have further derived evidence on the location of onions, such as the interaction of onions with dislocations and with the sample edge, the latter of which was observed due to irradiation-enhanced evaporation of Cu. On the other hand, carbon nanocapsules (concentric graphitic spheres with cavities), typically observed in implanted polycrystalline Cu substrates, were formed through the graphitization at substrate grain boundaries and following emission of the encapsulated copper particles.
引用
收藏
页码:S183 / S187
页数:5
相关论文
共 11 条
[1]   Formation mechanisms for carbon onions and nanocapsules in C+-ion implanted copper [J].
Abe, H ;
Yamamoto, S ;
Miyashita, A ;
Sickafus, KE .
JOURNAL OF APPLIED PHYSICS, 2001, 90 (07) :3353-3358
[2]   The migration of metal atoms through carbon onions [J].
Banhart, F ;
Redlich, P ;
Ajayan, PM .
CHEMICAL PHYSICS LETTERS, 1998, 292 (4-6) :554-560
[3]   Fullerene onion formation by carbon-ion implantation into copper [J].
Cabioch, T ;
Riviere, JP ;
Jaouen, M ;
Delafond, J ;
Denanot, MF .
SYNTHETIC METALS, 1996, 77 (1-3) :253-256
[4]   A NEW TECHNIQUE FOR FULLERENE ONION FORMATION [J].
CABIOCH, T ;
RIVIERE, JP ;
DELAFOND, J .
JOURNAL OF MATERIALS SCIENCE, 1995, 30 (19) :4787-4792
[5]   STRUCTURE AND KINETICS OF CASCADES IN COPPER UNDER ION AND OR ELECTRON-IRRADIATION [J].
FUKUMOTO, K ;
KINOSHITA, C ;
ABE, H ;
SHINOHARA, K ;
KUTSUWADA, M .
JOURNAL OF NUCLEAR MATERIALS, 1991, 179 :935-938
[6]   HEAVY-ION DAMAGE IN SILICON AND GERMANIUM [J].
HOWE, LM ;
RAINVILLE, MH .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :61-66
[8]   ONION-LIKE CARBON FROM ULTRA-DISPERSE DIAMOND [J].
KUZNETSOV, VL ;
CHUVILIN, AL ;
BUTENKO, YV ;
MALKOV, IY ;
TITOV, VM .
CHEMICAL PHYSICS LETTERS, 1994, 222 (04) :343-348
[9]   INSITU OBSERVATION OF CASCADE DAMAGE IN NICKEL AND COPPER UNDER HEAVY-ION IRRADIATION [J].
SAKAIDA, H ;
SEKIMURA, N ;
ISHINO, S .
JOURNAL OF NUCLEAR MATERIALS, 1991, 179 :928-930
[10]   CURLING AND CLOSURE OF GRAPHITIC NETWORKS UNDER ELECTRON-BEAM IRRADIATION [J].
UGARTE, D .
NATURE, 1992, 359 (6397) :707-709