Effect of zinc nitrate concentration on structural and optical properties of ZnO thin films deposited by Spray Plasma device

被引：4

作者：

Baba, K. ^{[1
]}

Lazzaroni, C. ^{[1
]}

Brinza, O. ^{[1
]}

Nikravech, M. ^{[1
]}

机构：

[1] Univ Paris 13, Sorbonne Paris Cite, LSPM CNRS, Lab Sci Proc & Mat, F-93430 Villetaneuse, France

来源：

THIN SOLID FILMS | 2014年 / 558卷

关键词：

Zinc oxide; Zinc nitrate; Precursor solution concentration; Plasma Spray deposition; Williamson-Hall; X-ray diffraction; CHEMICAL-VAPOR-DEPOSITION; ELECTRICAL-PROPERTIES; CHLORIDE PRECURSORS; TEMPERATURE; PYROLYSIS; THICKNESS; EMISSION; EPITAXY; ACETATE; GROWTH;

D O I：

10.1016/j.tsf.2014.02.067

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZnO thin films were deposited on glass substrate at 200 degrees C by Spray Plasma device using an aqueous solution of zinc nitrate. In this technique, the energy required for chemical transformations of precursors to zinc oxide is provided by plasma electrons rather than heat transfer. The effect of solution concentration on the structural and optical properties of the deposited films was investigated. X-ray diffraction results show that nanostructured polycrystalline films are formed with the typical wurtzite structure. The c-axis orientation growth depends highly on the initial concentration of precursor. Williamson-Hall calculations, atomic force and transmission electron microscopy images show an increase of grain size with an increase in molar concentration from 0.1 to 0.4 M. The transmittance decreases from 85 to 50% with an increase of the molar concentration. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：62 / 66

页数：5

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