Ultrafast vibrational dynamics and stability of deuterated amorphous silicon

被引:19
作者
Wells, JPR
Schropp, REI
van der Meer, LFG
Dijkhuis, JI
机构
[1] FOM, Inst Plasmaphys Rijnhuizen, Felix Free Electron Laser Facil, NL-3430 BE Nieuwegein, Netherlands
[2] Univ Utrecht, Debye Inst, NL-3508 TA Utrecht, Netherlands
关键词
D O I
10.1103/PhysRevLett.89.125504
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Infrared four-wave mixing experiments performed upon deuterated amorphous silicon layers (a-Si : D) reveal profound differences in the dynamics of Si-D stretch vibrations compared to those of analogous Si-H vibrational modes in hydrogenated amorphous silicon (a-Si : H). Remarkably, transient-grating measurements of the population decay rate of the Si-D vibrations show single-exponential decay directly into collective modes of the a-Si host, bypassing the local bending modes of the defect into which the Si-H vibrations decay. Photon-echo measurements of the vibrational dephasing suggest at low temperature contributions from TO nonequilibrium phonons and at elevated temperatures elastic phonon scattering of TA phonons.
引用
收藏
页码:125504 / 125504
页数:4
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