Low-threshold ablation of dielectrics irradiated by picosecond soft x-ray laser pulses

被引:45
作者
Faenov, A. Ya [1 ,2 ]
Inogamov, N. A. [3 ]
Zhakhovskii, V. V. [2 ,4 ]
Khokhlov, V. A. [3 ]
Nishihara, K. [4 ]
Kato, Y. [1 ,5 ]
Tanaka, M. [1 ]
Pikuz, T. A. [1 ,2 ]
Kishimoto, M. [1 ]
Ishino, M. [1 ]
Nishikino, M. [1 ]
Nakamura, T. [1 ]
Fukuda, Y. [1 ]
Bulanov, S. V. [1 ]
Kawachi, T. [1 ]
机构
[1] Japan Atom Energy Agcy, Kansai Photon Sci Inst, Kizu, Kyoto 6190215, Japan
[2] Russian Acad Sci, Joint Inst High Temperatures, Moscow 125412, Russia
[3] Russian Acad Sci, LD Landau Theoret Phys Inst, Chernogolovka 142432, Russia
[4] Inst Laser Engn, Suita, Osaka 5650871, Japan
[5] New Photon Ind, Grad Sch Creat, Shizuoka 4311202, Japan
关键词
dielectric materials; heat conduction; laser ablation; lithium compounds; 13.9; NM; BEAM;
D O I
10.1063/1.3152290
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ablation of LiF crystal by soft x-ray laser (XRL) pulses with wavelength lambda=13.9 nm and duration T(L)=7 ps is studied experimentally and theoretically. It is found that a crater appears on a surface of LiF for XRL fluence, exceeding the ablation threshold F(a)similar to 10.2 mJ/cm(2) in one shot, or 5 mJ/cm(2) in each of the three XRL shots. This is substantially below the ablation thresholds obtained with other lasers having longer pulse duration and/or longer wavelength. A mechanism of thermomechanical ablation in large bandgap dielectrics is proposed. The theory explains the low F(a) via small attenuation depth, absence of light reflection, and electron heat conductivity.
引用
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页数:3
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