High-index optical materials for 193-nm immersion lithography

被引：5

作者：

Burnett, John H. ^{[1
]}

Kaplan, Simon G. ^{[1
]}

Shirley, Eric L. ^{[1
]}

Horowitz, Deane ^{[1
]}

Clauss, Wilfried ^{[2
]}

Grenville, Andrew ^{[3
,4
]}

Van Peski, Chris ^{[3
]}

机构：

[1] NIST, 100 Bur Dr, Gaithersburg, MD 20899 USA

[2] Carl Zeiss SMT AG, D-73447 Oberkochen, Germany

[3] SEMATECH, Austin, TX 78741 USA

[4] Intel Corp, Santa Clara, CA USA

来源：

OPTICAL MICROLITHOGRAPHY XIX, PTS 1-3 | 2006年 / 6154卷

关键词：

high index materials; immersion lithography; 193 nm lithography; hyper NA; ceramic spinel oxides; garnets;

D O I：

10.1117/12.656901

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We report on our comprehensive survey of high-index UV optical materials that may enable extension of immersion lithography beyond a numerical aperture of 1.45. Band edge, refractive index, and intrinsic birefringence (IBR) at 193 nm determine basic viability. Our measurements of these properties have reduced the list of potential candidates to: ceramic spinel, lutetium aluminum garnet, and a class of germanium garnets. We discuss our measurements of the intrinsic properties of these materials and assess the present status of their material quality relative to requirements. Ceramic spinel has no significant IBR, but transmission and scatter for the best samples remain at least two orders of magnitude from specifications. Improving these would require a major development effort. Presently available lutetium aluminum garnet has material quality much closer to the specifications. However, the IBR is about three times the required value. The germanium garnets offer the possibility of a lower IBR, but a suitable candidate material has yet to be established.

引用

页码：U545 / U556

页数：12

共 25 条

[1]

[Anonymous], INT S IMM 157 NM LIT

[2]

Bezuidenhout D. F., 1998, HDB OPTICAL CONSTANT, P815

[3] High refractive index immersion fluids for 193nm immersion lithography [J].

Budhlall, B ;

Parris, G ;

Zhang, P ;

Gao, XP ;

Zarkov, Z ;

Ross, B ;

Kaplan, S ;

Burnett, J .

Optical Microlithography XVIII, Pts 1-3, 2005, 5754 :622-629

[4] High-index materials for 193 nm immersion lithography [J].

Burnett, JH ;

Kaplan, SG ;

Shirley, EL ;

Tompkins, PJ ;

Webb, JE .

OPTICAL MICROLITHOGRAPHY XVIII, PTS 1-3, 2005, 5754 :611-621

[5] Measurement of the refractive index and thermo-optic coefficient of water near 193 nm [J].

Burnett, JH ;

Kaplan, SG .

JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2004, 3 (01) :68-72

[6] Absolute refractive indices and thermal coefficients of CaF2, SrF2, BaF2, and LiF near 157 nm [J].

Burnett, JH ;

Gupta, R ;

Griesmann, U .

APPLIED OPTICS, 2002, 41 (13) :2508-2513

[7] Intrinsic birefringence in calcium fluoride and barium fluoride [J].

Burnett, JH ;

Levine, ZH ;

Shirley, EL .

PHYSICAL REVIEW B, 2001, 64 (24)

[8]

BURNETT JH, 2005, 2 INT S IMM LITH INT

[9] Imaging of 32-nm 1 : 1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k1 of 0.25 -: art. no. 031103 [J].

French, RH ;

Sewell, H ;

Yang, MK ;

Peng, S ;

McCafferty, D ;

Qiu, WM ;

Wheland, RC ;

Lemon, MF ;

Markoya, L ;

Crawford, MK .

JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2005, 4 (03)

[10] CRYSTAL CHEMISTRY OF GARNETS [J].

GELLER, S .

ZEITSCHRIFT FUR KRISTALLOGRAPHIE KRISTALLGEOMETRIE KRISTALLPHYSIK KRISTALLCHEMIE, 1967, 125 (1-6) :1-&

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