Study of dopant-dependent band gap narrowing in compound semiconductor devices

被引:57
作者
Palankovski, V [1 ]
Kaiblinger-Grujin, G [1 ]
Selberherr, S [1 ]
机构
[1] Vienna Tech Univ, Inst Microelect, A-1040 Vienna, Austria
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1999年 / 66卷 / 1-3期
关键词
band gap narrowing; compound semiconductors; device physics; HBTs; modeling; simulation;
D O I
10.1016/S0921-5107(99)00118-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Band gap narrowing (BGN) is one of the crucial heavy-doping effects to be considered for bipolar devices. Using a physically-based approach (E.F. Schubert, Doping in III-V Semiconductors, Cambridge University Press, 1993), we suggest a new BGN model which considers the semiconductor material and the dopant species for arbitrary finite temperatures. This unified treatment is especially useful for accurate device simulation. A comparison with experimental data and other existing models is presented and study of BGN in III-V group semiconductors is performed. Finally, as a particular example we investigated with our two-dimensional device simulator MINIMOS-NT (Simlinger et al., Simulation of submicron double-heterojunction high electron mobility transistors with MINIMOS-NT, IEEE Trans. Electron. Devices, Vol. 44, 1997, pp. 700-707), the electrical behavior of a graded composition Si/SiGe HBT using a hydrodynamic transport model. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:46 / 49
页数:4
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