EFFECT OF ULTRASONIC ON COPPER ELECTROPLATING FROM THE NON-CYANIDE ALKALINE BATHS

被引:2
作者
Li, Minggang [1 ]
Hu, Shuangshuang [1 ]
Yang, Yejiong [1 ]
Xu, Shuhan [1 ]
Zhao, Xixi [1 ]
Wei, Guoying [1 ]
机构
[1] China Jiliang Univ, Coll Mat Sci & Engn, Hangzhou 310018, Zhejiang, Peoples R China
关键词
Cu thin film; electrochemical methods; quartz crystal microbalance; ultrasonic; SILVER NANOPARTICLES; ELECTRODEPOSITION;
D O I
10.1142/S0218625X14500577
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Effects of the different ultrasonic powers on copper electrodeposition from non-cyanide alkaline baths by using pyrophosphate as complexing agent were investigated by different electrochemical methods. Cyclic voltammetry and current transient measurements were used to characterize the nucleation and growth mechanism. It is very obvious that the reduction potential moves to more positive one as the ultrasonic power increases. The quartz crystal microbalance (QCM) and chronoamperometric method were used to study the relationship between the mass change and the deposition time. It was found that the current efficiency of electrolyte under 0, 60, 80 and 100 W is 91.95%, 92.14%, 89.25% and 96.11%, respectively measured by QCM measurements. The surface morphology of the electrodeposited Cu films is analyzed by scanning electron microscopy (SEM). The morphology of copper films electrodeposited under the power of 60 W and 80 W presents a compact surface and the grains are fine and uniform.
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页数:6
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