Multilayer processing of high-Tc films and stacked bicrystal Josephson junctions

被引：0
|
作者：
Li, HQ
Ono, RH
Rudman, DA
Vale, LR
Liou, SH
机构：
[1] Natl Inst Stand & Technol, Boulder, CO 80303 USA
[2] Univ Nebraska, Lincoln, NE USA
来源：
APPLIED SUPERCONDUCTIVITY | 1998年 / 6卷 / 10-12期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A new process for making high-temperature superconducting multilayer circuits is reported in detail. Proximity exposure was used to form controllable shallow edges which are required for the crossovers and interconnects. Small features with shallow edges can be achieved by the combination of contact exposure and proximity exposure. Stacked Josephson junctions on STO bicrystal substrates were prepared using this process and tested. A multilayer low-inductance dc-SQUID fabricated using this process shows large voltage modulation. Published by Elsevier Science Ltd.
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页码：711 / 717
页数：7
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