Higher order nonlinear dielectric microscopy

被引:0
作者
Cho, Y [1 ]
Ohara, K [1 ]
机构
[1] Tohoku Univ, Res Inst Elect Commun, Sendai, Miyagi 9808577, Japan
来源
FERROELECTRIC THIN FILMS X | 2002年 / 688卷
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A higher order nonlinear dielectric microscopy technique with higher lateral and depth resolution than conventional nonlinear dielectric imaging is investigated. The proposed technique involves the measurement of higher order nonlinear dielectric constants, with a depth resolution of down to 1.5 nm. The technique is demonstrated to be very useful for observing surface layers of the order of unit cell thickness on ferroelectric materials.
引用
收藏
页码:329 / 334
页数:6
相关论文
共 6 条
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