Irradiation-induced amorphization of graphite: a dislocation accumulation model

被引：34
作者：
Niwase, K [1 ]
机构：
[1] Hyogo Univ Teachers Educ, Dept Phys, Yashiro, Hyogo 6731494, Japan
来源：
PHILOSOPHICAL MAGAZINE LETTERS | 2002年 / 82卷 / 07期
关键词：
D O I：
10.1080/09500830210137416
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We present a kinetic model to explain irradiation-induced phenomena in graphite up to a high dose of amorphization. We attribute the origin of amorphization to the accumulation of dislocation dipoles instead of a disordered region assumed in a previous model by Niwase. Calculated results for the change in a sample dimension up to amorphization and the Raman intensity ratio in a low-damage range compare favourably with the experimental results, revealing the existence of a barrier inhibiting the mutual annihilation of an interstitial and a vacancy.
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页码：401 / 408
页数：8
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