Enhanced direct bandgap emission in germanium by micromechanical strain engineering

被引:83
作者
Lim, Peng Huei [1 ]
Park, Sungbong [1 ]
Ishikawa, Yasuhiko [1 ]
Wada, Kazumi [1 ]
机构
[1] Univ Tokyo, Dept Mat Engn, Bunkyo Ku, Tokyo 1138656, Japan
来源
OPTICS EXPRESS | 2009年 / 17卷 / 18期
关键词
GAP SHRINKAGE; GE; SI; SILICON; HETEROSTRUCTURES; STRENGTH; FILMS; GAIN;
D O I
10.1364/OE.17.016358
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We propose a new class of optoelectronic devices in which the optical properties of the active material is enhanced by strain generated from micromechanical structures. As a concrete example, we modeled the emission efficiency of strained germanium supported by a cantilever-like platform. Our simulations indicate that net optical gain is obtainable even in indirect germanium under a substrate biaxial tensile strain of about 1.5% with an electron-hole injection concentration of 9x10(18) cm(-3) while direct bandgap germanium becomes available at a strain of 2%. A large wavelength tuning span of 400 nm in the mid-IR range also opens up the possibility of a tunable on-chip germanium biomedical light source. (C) 2009 Optical Society of America
引用
收藏
页码:16358 / 16365
页数:8
相关论文
共 37 条
[1]   Methyl monolayers improve the fracture strength and durability of silicon nanobeams [J].
Alan, Tuncay ;
Zehnder, Alan T. ;
Sengupta, Debodhonyaa ;
Hines, Melissa A. .
APPLIED PHYSICS LETTERS, 2006, 89 (23)
[2]   Controlling and testing the fracture strength of silicon on the mesoscale [J].
Chen, KS ;
Ayon, A ;
Spearing, SM .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2000, 83 (06) :1476-1484
[3]   THEORETICAL GAIN OF STRAINED-LAYER SEMICONDUCTOR-LASERS IN THE LARGE STRAIN REGIME [J].
CHONG, TC ;
FONSTAD, CG .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1989, 25 (02) :171-178
[4]  
Chung S. L., 1995, PHYS OPTOELECTRONIC
[5]  
DHAR S, 2007, THESIS VIENNA U TECH
[6]   Two-dimensional photonic crystals with pure germanium-on-insulator [J].
El Kurdi, M. ;
David, S. ;
Checoury, X. ;
Fishman, G. ;
Boucaud, P. ;
Kermarrec, O. ;
Bensahel, D. ;
Ghyselen, B. .
OPTICS COMMUNICATIONS, 2008, 281 (04) :846-850
[7]   Enhanced photoluminescence of heavily n-doped germanium [J].
El Kurdi, M. ;
Kociniewski, T. ;
Ngo, T. -P. ;
Boulmer, J. ;
Debarre, D. ;
Boucaud, P. ;
Damlencourt, J. F. ;
Kermarrec, O. ;
Bensahel, D. .
APPLIED PHYSICS LETTERS, 2009, 94 (19)
[8]   Germanium hut nanostressors on freestanding thin silicon membranes [J].
Evans, PG ;
Tinberg, DS ;
Roberts, MM ;
Lagally, MG ;
Xiao, Y ;
Lai, B ;
Cai, Z .
APPLIED PHYSICS LETTERS, 2005, 87 (07)
[9]   Polycrystalline silicon-germanium films for integrated microsystems [J].
Franke, AE ;
Heck, JM ;
King, TJ ;
Howe, RT .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 2003, 12 (02) :160-171
[10]   Post-CMOS integration of germanium microstructures [J].
Franke, AE ;
Bilic, D ;
Chang, DT ;
Jones, PT ;
King, TJ ;
Howe, RT ;
Johnson, GC .
MEMS '99: TWELFTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 1999, :630-637