Terahertz time-domain spectroscopy characterization of the far-infrared absorption and index of refraction of high-resistivity, float-zone silicon

被引:396
作者
Dai, JM [1 ]
Zhang, JQ [1 ]
Zhang, WL [1 ]
Grischkowsky, D [1 ]
机构
[1] Oklahoma State Univ, Sch Elect & Comp Engn, Stillwater, OK 74078 USA
关键词
D O I
10.1364/JOSAB.21.001379
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The far-infrared absorption and index of refraction of high-resistivity, float-zone, crystalline silicon has been measured by terahertz time-domain spectroscopy. The measured new upper limit for the absorption of this most transparent dielectric material in the far infrared shows unprecedented transparency over the range from 0.5 to 2.5 THz and a well-resolved absorption feature at 3.6 THz. The index of refraction shows remarkably little dispersion, changing by only 0.0001 over the range from 0.5 to 4.5 THz. (C) 2004 Optical Society of America.
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页码:1379 / 1386
页数:8
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