Unveiling the phonon scattering mechanisms in half-Heusler thermoelectric compounds

被引:75
作者
He, Ran [1 ]
Zhu, Taishan [2 ]
Wang, Yumei [3 ]
Wolff, Ulrike [1 ]
Jaud, Jean-Christophe [4 ]
Sotnikov, Andrei [1 ]
Potapov, Pavel [1 ]
Wolf, Daniel [1 ]
Ying, Pingjun [1 ]
Wood, Max [5 ]
Liu, Zhenhui [1 ,6 ]
Feng, Le [1 ,6 ]
Rodriguez, Nicolas Perez [1 ]
Snyder, G. Jeffrey [5 ]
Grossman, Jeffrey C. [2 ]
Nielsch, Kornelius [1 ,6 ,7 ]
Schierning, Gabi [1 ]
机构
[1] Leibniz Inst Solid State & Mat Res, D-01069 Dresden, Germany
[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[3] Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
[4] Tech Univ Darmstadt, Dept Mat & Earth Sci, D-64287 Darmstadt, Germany
[5] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[6] Tech Univ Dresden, Inst Mat Sci, D-01062 Dresden, Germany
[7] Tech Univ Dresden, Inst Appl Phys, D-01062 Dresden, Germany
基金
美国国家科学基金会;
关键词
THERMAL-CONDUCTIVITY; POINT-DEFECTS; PERFORMANCE; FIGURE; MERIT; HF; OPTIMIZATION; ELECTRONS; VACANCIES; PROPERTY;
D O I
10.1039/d0ee03014g
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Half-Heusler (HH) compounds are among the most promising thermoelectric (TE) materials for large-scale applications due to their superior properties such as high power factor, excellent mechanical and thermal reliability, and non-toxicity. Their only drawback is the remaining-high lattice thermal conductivity. Various mechanisms were reported with claimed effectiveness to enhance the phonon scattering of HH compounds including grain-boundary scattering, phase separation, and electron-phonon interaction. In this work, however, we show that point-defect scattering has been the dominant mechanism for phonon scattering other than the intrinsic phonon-phonon interaction for ZrCoSb and possibly many other HH compounds. Induced by the charge-compensation effect, the formation of Co/4d Frenkel point defects is responsible for the drastic reduction of lattice thermal conductivity in ZrCoSb1-xSnx. Our work systematically depicts the phonon scattering profile of HH compounds and illuminates subsequent material optimizations.
引用
收藏
页码:5165 / 5176
页数:12
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