Plasma- and vacuum-ultraviolet (VUV) photo-polymerisation of N- and O-rich thin films

被引：25
作者：
Ruiz, Juan-Carlos [1 ]
Girard-Lauriault, Pierre-Luc [1 ]
Truica-Marasescu, Florina [1 ]
Wertheimer, Michael R. [1 ]
机构：
[1] Ecole Polytech, Dept Engn Phys, Grp Phys & Technol Couches Minces GCM, Montreal, PQ H3C 3A7, Canada
来源：
RADIATION PHYSICS AND CHEMISTRY | 2010年 / 79卷 / 03期
基金：
加拿大自然科学与工程研究理事会;
关键词：
Ethylene; N- and O-rich films; Photo-polymerisation; VUV-photochemistry; Plasma polymerisation; ATMOSPHERIC-PRESSURE; POLYMER FILMS; BIOMEDICAL APPLICATIONS; DEPOSITION; SURFACES;
D O I：
10.1016/j.radphyschem.2009.08.009
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Nitrogen (N)- and oxygen (O)-rich organic thin films were deposited by vacuum-ultraviolet (VUV)-assisted photo-chemical polymerisation of flowing ethylene (C2H4)-ammonia (NH3) and C2H4-nitrous oxide (N2O) mixtures of varying ratios, R, respectively. The reaction mechanism of these binary gas mixtures was investigated as a function of the wavelength, lambda, of two near-mono-chromatic VUV sources. Surface-near compositions of these "UV-PE:N" and "UV-PE:O" films were determined by X-ray photoelectron (XPS), and by Fourier transform (reflection-absorption) infrared (FTIR) spectroscopies. The two types of films were compared with plasma polymers deposited using low-pressure radiofrequency (r.f.) glow discharges in similar gas flow mixtures, "PPE:N" and 14 PPE:O". VUV-photochemistry appears to be superior to plasma-chemistry in its capability to produce nearly "mono-functional" organic thin films, ones that are rich in primary amines, -NH2, and in carboxylic acid groups, -COOH, respectively. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码：310 / 314
页数：5
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