Effect of nanocrystalline inclusions on the photosensitivity of amorphous hydrogenated silicon films

被引：6

作者：

Golikova, OA ^{[1
]}

Kazanin, MM ^{[1
]}

机构：

[1] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia

来源：

SEMICONDUCTORS | 2000年 / 34卷 / 06期

关键词：

D O I：

10.1134/1.1188064

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Photosensitivity of amorphous hydrogenated silicon films containing inclusions of Si nanocrystals, along with spectral characteristics of photoconductivity, were studied. A correlation between photosensitivity and features of the Raman spectra was established. The highest photosensitivity is observed in films with medium-range order formed to the maximum extent. (C) 2000 MAIK "Nauka/Interperiodica".

引用

页码：737 / 740

页数：4

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