Enhancement effect of nitrogen co-doping on oxygen precipitation in heavily phosphorus-doped Czochralski silicon during high-temperature annealing (vol 311, pg 3273, 2009)

被引:0
|
作者
Zeng, Yuheng [1 ]
Chen, Jiahe [1 ]
Ma, Miangyang [1 ]
Wang, Weiyan [1 ]
Yang, Deren [1 ]
机构
[1] Zhejiang Univ, Dept Mat Sci & Engn, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China
关键词
D O I
10.1016/j.jcrysgro.2010.01.012
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:734 / 734
页数:1
相关论文
共 5 条
  • [1] Enhancement effect of nitrogen co-doping on oxygen precipitation in heavily phosphorus-doped Czochralski silicon during high-temperature annealing
    Zeng, Yuheng
    Chen, Jiahe
    Ma, Miangyang
    Wang, Weiyan
    Yang, Deren
    JOURNAL OF CRYSTAL GROWTH, 2009, 311 (12) : 3273 - 3277
  • [2] Oxygen precipitation in heavily phosphorus-doped Czochralski silicon: effect of nitrogen codoping
    Zeng, Yuheng
    Ma, Xiangyang
    Chen, Jiahe
    Tian, Daxi
    Gong, Longfei
    Yang, Deren
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2009, 24 (10)
  • [3] Effect of nitrogen on oxygen precipitation in Czochralski silicon during high-temperature annealing
    Jiang, L
    Yang, DR
    Yu, XG
    Ma, XY
    Xu, J
    Que, DL
    ACTA PHYSICA SINICA, 2003, 52 (08) : 2000 - 2004
  • [4] Impact of germanium co-doping on oxygen precipitation in heavily boron-doped Czochralski silicon
    Zhao, Jian
    Dong, Peng
    Zhao, Jianjiang
    Ma, Xiangyang
    Yang, Deren
    SUPERLATTICES AND MICROSTRUCTURES, 2016, 99 : 35 - 40
  • [5] High temperature nitrogen annealing induced interstitial oxygen precipitation in silicon epitaxial layer on heavily arsenic-doped silicon wafer
    Wang, Q.
    Daggubati, Manmohan
    Yu, Rong
    Zhang, Xiao Feng
    APPLIED PHYSICS LETTERS, 2006, 88 (24)