Equations of state for silicon inversion layers

被引:37
作者
Ancona, MG [1 ]
机构
[1] USN, Res Lab, Washington, DC 20375 USA
关键词
D O I
10.1109/16.848290
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The accuracy of a generalized diffusion-drift description known as density-gradient theory for modeling the quantized inversion layer on (100) Si is studied in detail by comparing its results with corresponding Schrodinger-Poisson calculations, A key element of density-gradient theory is the equation of state used to model the response of the electron gas. A variety of such equations are considered including new approaches for modeling the lifting of the conduction band valley degeneracy and for representing exchange-correlation effects. On the whole, the theory does remarkably well over a wide range of biases, oxide thicknesses, and doping concentrations. For shallow wells and for simulating the density deep inside the semiconductor density-gradient theory actually outperforms the quantum mechanical approach unless the latter includes large numbers of subbands, When comparing with experiment, neither theory works that well in a predictive sense because of uncertainties in the treatment of the oxide and of the gate.
引用
收藏
页码:1449 / 1456
页数:8
相关论文
共 19 条
[1]   A NOTE ON THE FERMI-DIRAC INTEGRAL FUNCTION [J].
AGUILERANAVARRO, VC ;
ESTEVEZ, GA ;
KOSTECKI, A .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (08) :2848-2850
[2]   MACROSCOPIC DESCRIPTION OF QUANTUM-MECHANICAL TUNNELING [J].
ANCONA, MG .
PHYSICAL REVIEW B, 1990, 42 (02) :1222-1233
[3]   MACROSCOPIC PHYSICS OF THE SILICON INVERSION LAYER [J].
ANCONA, MG ;
TIERSTEN, HF .
PHYSICAL REVIEW B, 1987, 35 (15) :7959-7965
[4]   QUANTUM CORRECTION TO THE EQUATION OF STATE OF AN ELECTRON-GAS IN A SEMICONDUCTOR [J].
ANCONA, MG ;
IAFRATE, GJ .
PHYSICAL REVIEW B, 1989, 39 (13) :9536-9540
[5]  
ANCONA MG, 1990, SUPERLATTICE MICROST, P119
[6]  
ANCONA MG, 1999, P SISPAD, P235
[7]  
ANCONA MG, 1998, J TECH COMPUT AIDED
[8]   ELECTRONIC-PROPERTIES OF TWO-DIMENSIONAL SYSTEMS [J].
ANDO, T ;
FOWLER, AB ;
STERN, F .
REVIEWS OF MODERN PHYSICS, 1982, 54 (02) :437-672
[9]  
[Anonymous], P COMP EL WORKSH
[10]   Physical oxide thickness extraction and verification using quantum mechanical simulation [J].
Bowen, C ;
Fernando, CL ;
Klimeck, G ;
Chatterjee, A ;
Blanks, D ;
Lake, R ;
Hu, J ;
Davis, J ;
Kulkarni, M ;
Hattangady, S ;
Chen, IC .
INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, :869-872