Changes in surface stress caused by the adsorption of an epitaxial metal monolayer

被引：20
|
作者：
Leiva, EPM [1 ]
Del Pópolo, MG
Schmickler, W
机构：
[1] Univ Nacl Cordoba, Fac Ciencias Quim, Unidad Matemat & Fis, RA-5000 Cordoba, Argentina
[2] Univ Ulm, Abt Elektrochem, D-89069 Ulm, Germany
来源：
CHEMICAL PHYSICS LETTERS | 2000年 / 320卷 / 5-6期
关键词：
D O I：
10.1016/S0009-2614(00)00240-2
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The adsorption of a metal monolayer on a foreign substrate generates a change in the surface stress. We calculate this change for a number of substrate/adsorbate systems using the embedded-atom method. The results are compared with those obtained from a continuum model. A cycle, in which the stretching of a substrate/adsorbate system is decomposed into several steps, helps in understanding the numerical results. (C) 2000 Elsevier Science B.V. All rights reserved.
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页码：393 / 397
页数：5
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