Suspended Spiral Inductor and Band-Pass Filter on Thick Anodized Aluminum Oxide

被引:13
作者
Yook, Jong-Min [1 ]
Kim, Kyoung-Min [1 ]
Kwon, Young-Se [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Elect Engn, Taejon 305701, South Korea
关键词
Air-cavity; anodized aluminum; high Q inductor; suspended inductor; 2.45 GHz band-pass filter (BPF); FABRICATION;
D O I
10.1109/LMWC.2009.2029735
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We make suspended inductors and 2.45 GHz BPFs on the selectively anodized aluminum. The thick anodized alumina is used as the supporting dielectric and it is easily removed by using chemical wet-etching. The thickness of anodized alumina is 80 m and the depth of the total air-cavity is 200 m. The fabricated inductor over an air cavity has a 25% greater Q factor and 21% higher inductance at 2 GHz compared to an inductor on anodized aluminum. The 2.45 GHz BPF adjusting the suspended inductors has 2.8 dB of insertion loss with a narrow bandwidth.
引用
收藏
页码:620 / 622
页数:3
相关论文
共 10 条
[1]   Fabrication of microstructures by wet etching of anodic aluminum oxide substrates [J].
Jee, SE ;
Lee, PS ;
Yoon, BJ ;
Jeong, SH ;
Lee, KH .
CHEMISTRY OF MATERIALS, 2005, 17 (16) :4049-4052
[2]   High performance RF integrated passive devices on thick oxide substrate using Cu-BcB process [J].
Jeong, I ;
Kim, KJ ;
Kong, TO ;
Kim, JS ;
Choi, HK ;
Nam, CM ;
Kim, DW ;
Kwon, YS .
MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, 2003, 37 (01) :49-52
[3]  
Lee J.-H., 2006, P EUR MICR C SEPT, P1387
[4]   A robust high-Q micromachined RF inductor for RFIC applications [J].
Lin, JW ;
Chen, CC ;
Cheng, YT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2005, 52 (07) :1489-1496
[5]  
LIU K, 2007, IEEE MTT S INT MICR, P2117
[6]   Compact harmonic filter design and fabrication using IPD technology [J].
Liu, Lianjun ;
Kuo, Shun-Meen ;
Abrokwah, Jon ;
Ray, Marcus ;
Maurer, David ;
Miller, Mel .
IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, 2007, 30 (04) :556-562
[7]   Surface-passivated high-resistivity silicon substrates for RFICs [J].
Rong, B ;
Burghartz, JN ;
Nanver, LK ;
Rejaei, B ;
van der Zwan, M .
IEEE ELECTRON DEVICE LETTERS, 2004, 25 (04) :176-178
[8]  
Shin SH, 2005, ELEC COMP C, P1904
[9]   Spiral inductors using polymer-core conductors [J].
Yook, Jong-Min ;
Kwon, Young-Se .
IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, 2007, 17 (07) :495-497
[10]   CMOS-compatible surface-micromachined suspended-spiral inductors for multi-GHz silicon RF ICs [J].
Yoon, JB ;
Choi, YS ;
Kim, BI ;
Eo, Y ;
Yoon, E .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (10) :591-593