Effective Permittivity and Refractive Index of TiO2/Ge and SiO2/Ge Nanostructures at High Frequencies

被引：5

作者：

Sadeghi, H. ^{[1
]}

Zolanvar, A. ^{[1
]}

Ranjgar, A. ^{[1
]}

Norouzi, R. ^{[1
]}

机构：

[1] Arak Univ, Dept Phys, Fac Sci, Arak 8349838156, Iran

来源：

JOURNAL OF ELECTRONIC MATERIALS | 2014年 / 43卷 / 11期

关键词：

Nanostructured materials; plasmonics; effective permittivity; refractive index; PLASMONICS;

D O I：

10.1007/s11664-014-3367-z

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have calculated the effective permittivity and refractive index of TiO2/Ge and SiO2/Ge nanostructures for a broad range of terahertz frequencies. The structures are composites of two different kinds of nanosphere, one made from high-refractive-index dielectric materials of different radius and the other from n-type germanium.

引用

页码：4294 / 4300

页数：7

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