Effective Permittivity and Refractive Index of TiO2/Ge and SiO2/Ge Nanostructures at High Frequencies

被引：5
|
作者：
Sadeghi, H. [1 ]
Zolanvar, A. [1 ]
Ranjgar, A. [1 ]
Norouzi, R. [1 ]
机构：
[1] Arak Univ, Dept Phys, Fac Sci, Arak 8349838156, Iran
来源：
JOURNAL OF ELECTRONIC MATERIALS | 2014年 / 43卷 / 11期
关键词：
Nanostructured materials; plasmonics; effective permittivity; refractive index; PLASMONICS;
D O I：
10.1007/s11664-014-3367-z
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have calculated the effective permittivity and refractive index of TiO2/Ge and SiO2/Ge nanostructures for a broad range of terahertz frequencies. The structures are composites of two different kinds of nanosphere, one made from high-refractive-index dielectric materials of different radius and the other from n-type germanium.
引用
收藏
页码：4294 / 4300
页数：7
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