Characteristics of ion beams from a Penning source for focused ion beam applications

被引:21
作者
Guharay, SK [1 ]
Sokolovsky, E [1 ]
Orloff, J [1 ]
机构
[1] Univ Maryland, Inst Plasma Res, College Pk, MD 20742 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期
关键词
D O I
10.1116/1.591064
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Focused ion beam characteristics, measured by using PMMA resist exposures, show significant improvement of the previously reported results for hydrogen ion beams. A beam current density of >50 mA cm(-2) at 6-7 keV has been obtained over a spot size of 2.3 mu m, estimated from the full width at half maximum of the intensity distribution. A single Einzel lens with magnification of about 0.1 was used. A target current density of >1 A/cm(2) can be achieved with this beam for a lens system with overall magnification of similar to 0.01. In experiments with Ar, both the discharge current and extracted beam current increased by more than a factor of 2 when the discharge cell length was increased by about 25% with respect to the nominal cell length for operation with H. Ar ion beams were extracted with an angular beam intensity of >5 mA sr(-1), brightness (90% beam) of similar to 10(3)A sr(-1) cm(-2) at 10 keV, and energy spread of similar to 4.5 eV. Greatly improved beam characteristics, with brightness >10(4) A sr(-1) cm(-2), are expected by optimization of the source for Ar beams. (C) 1999 American Vacuum Society. [S0734-211X(99)05206-3].
引用
收藏
页码:2779 / 2782
页数:4
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