共 25 条
- [2] BASHKEEV AA, 1990, AIP CONF PROC, V210, P329, DOI 10.1063/1.39611
- [3] A LOW-CURRENT LIQUID-METAL ION-SOURCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 927 - 930
- [4] BROWN IG, 1989, PHYSICS TECHNOLOGY I
- [5] ION SOURCES FOR ION-BEAM ASSISTED THIN-FILM DEPOSITION [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (11) : 5217 - 5233
- [8] High-brightness ion source for ion projection lithography [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 3907 - 3910
- [9] Characteristics of focused beam spots using negative ion beams from a compact surface plasma source and merits for new applications [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3370 - 3373
- [10] FAVORABLE SOURCE MATERIAL IN LIQUID-METAL-ION SOURCES FOR FOCUSED BEAM APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 931 - 935