Formation and microstructural investigation of Ag-Cu alloy nanoclusters embedded inSiO2 formed by sequential ion implantation

被引：17
|
作者：
Ren, F
Jiang, CZ [1 ]
Zhang, L
Shi, Y
Wang, JB
Wang, RH
机构：
[1] Wuhan Univ, Dept Phys, Wuhan 430072, Peoples R China
[2] Wuhan Univ, Ctr Electron Microscopy, Wuhan 430072, Peoples R China
来源：
MICRON | 2004年 / 35卷 / 06期
关键词：
ion implantation; nanocluster composites; high resolution transmission electron microscopy; distortion; defects;
D O I：
10.1016/j.micron.2004.01.011
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
We report on the formation of alloy nanoclusters in silica by Ag/Cu ion sequential implantation. The formation of alloy nanocluster has been evidenced by optical absorption spectra, selected area electron diffraction and energy dispersive X-ray spectra. The microstructure characters of nanoclusters have been studied by high resolution transmission electron microscopy. The lattice distortion of some nanoclusters has been observed. A model has been given to explain the distortion. Some defects (partial dislocation, stacking faults) have been found in nanoclusters. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码：489 / 493
页数：5
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