Size effect and temperature dependence of spin conduction in Gd/SiN ultrathin film

被引:3
作者
Horiguchi, A [1 ]
Matsuda, T [1 ]
Watanabe, Y [1 ]
机构
[1] Kyushu Inst Technol, Fukuoka 8048550, Japan
关键词
D O I
10.1063/1.372784
中图分类号
O59 [应用物理学];
学科分类号
摘要
The possibility of enhancing the resistivity while preserving magnetism is investigated by growing metal/insulator trilayers and superlattices, where the metal is Gd and the insulator is amorphous Si3N4 for the first time. A large size effect on Curie temperature (T-C) is found in the susceptibility in contrast with Gd epitaxially grown on metals. T-C decreases to 180 K, i.e., 70% of the bulk T-C in 10 nm thick Gd film, which is attributed to an electrical isolation and surface states. On the other hand, the susceptibility chi at T-C is almost unchanged as in epitaxial Gd on metal. The resistivity R doubled as the Gd layer thickness decreases from 100 to 10 nm, and the T-C estimated from R agrees with that from chi. Additionally, a possible interlayer coupling or an effect of surface layers adjacent to Si3N4 was detected in superlattices. (C) 2000 American Institute of Physics. [S0021-8979(00)86808-5].
引用
收藏
页码:6603 / 6605
页数:3
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