共 18 条
- [11] LEUNISSEN LHA, IN PRESS MICROELECTR
- [12] Comparison of metrology methods for quantifying the line edge roughness of patterned features [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2488 - 2498
- [13] ROUGHNESS SPECTRUM AND SURFACE WIDTH OF SELF-AFFINE FRACTAL SURFACES VIA THE K-CORRELATION MODEL [J]. PHYSICAL REVIEW B, 1993, 48 (19): : 14472 - 14478
- [15] Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (03): : 1008 - 1018
- [16] Effects of processing parameters on line width roughness [J]. ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 384 - 392
- [17] Characterization of line-edge roughness in resist patterns and estimation of its effect on device performance [J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVII, PTS 1 AND 2, 2003, 5038 : 689 - 698
- [18] Zhao B. Y., 2001, CHARACTERIZATION AMO, V37