Cutting of polished single-crystal silicon by wire electrical discharge machining

被引:48
作者
Takino, H
Ichinohe, T
Tanimoto, K
Yamaguchi, S
Nomura, K
Kunieda, M
机构
[1] Nikon Inc, Sagamihara, Kanagawa 2280828, Japan
[2] Tokyo Univ Agr & Technol, Koganei, Tokyo 1848588, Japan
来源
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY | 2004年 / 28卷 / 03期
关键词
wire electrical discharge machining; WEDM; silicon; optics; mirror; surface;
D O I
10.1016/j.precisioneng.2003.12.002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Smoothly polished single-crystal silicon plates were cut by wire electrical discharge machining (WEDM) in water and in oil in order to investigate the effect of WEDM on the polished surfaces. For cutting in water, polished surfaces near cut sections have chips and cracks, and are extremely rough; the rough regions are upheaved. Examinations suggest that the upheaved region is silicon dioxide and results from oxidization of the surfaces by WEDM. Moreover, the polished surfaces far from the cut section are somewhat rough. For cutting in oil, polished surfaces near a cut section are smooth and almost flat although they have chips and cracks. These findings indicate the WEDM in oil is better than that in water for cutting polished single-crystal silicon to obtain high-quality surfaces. (C) 2004 Elsevier Inc. All rights reserved.
引用
收藏
页码:314 / 319
页数:6
相关论文
共 20 条
[1]   An empirical survey on the influence of machining parameters on tool wear in diamond turning of large single-crystal silicon optics [J].
Born, DK ;
Goodman, WA .
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2001, 25 (04) :247-257
[2]  
CHAN SL, 1997, P INT C PREC ENG 97, P581
[3]   Fabrication and metrology of high quality synchrotron mirrors in the sub-arcsec regime [J].
Derst, G ;
Handschuh, H ;
Schmidt, M ;
Werner, K .
MATERIALS, MANUFACTURING, AND MEASUREMENT FOR SYNCHROTRON RADIATION MIRRORS, 1997, 3152 :51-58
[4]  
FURUDATE C, 2002, P ANN M JAP SOC EL M, P9
[5]   Microstructuring of silicon by electro-discharge machining (EDM) .2. applications [J].
Heeren, PH ;
Reynaerts, D ;
VanBrussel, H ;
Beuret, C ;
Larsson, O ;
Bertholds, A .
SENSORS AND ACTUATORS A-PHYSICAL, 1997, 61 (1-3) :379-386
[6]   Design, fabrication and testing of lightweight silicon mirrors [J].
Jacoby, MT ;
Montgomery, EE ;
Fortini, AJ ;
Goodman, WA .
OPTOMECHANICAL ENGINEERING AND VIBRATION CONTROL, 1999, 3786 :460-467
[7]   Novel illumination system for EUVL [J].
Komatsuda, H .
EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 :765-776
[8]   Improvement of EDM efficiency of silicon single crystal through ohmic contact [J].
Kunieda, M ;
Ojima, S .
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2000, 24 (03) :185-190
[9]  
LEISTNER AJ, 1995, P SOC PHOTO-OPT INS, V2536, P302, DOI 10.1117/12.218436
[10]  
Okada A, 1998, VDI BERICHT, V1405, P417