Effects of perpendicular magnetic anisotropy on a large enhancement of elastic light scattering in ultrathin Co films

被引：1
作者：
Hyomi, K
Murayama, A
Oka, Y
Falco, CM
机构：
[1] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Univ Arizona, Opt Sci Ctr, Tucson, AZ 85721 USA
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2002年 / 240卷 / 1-3期
关键词：
Brillouin scattering; anisotropy-perpendicular;
D O I：
10.1016/S0304-8853(01)00831-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Effects of a perpendicular magnetic anisotropy (PMA) on a large enhancement of elastic light scattering (ELS) in ultrathin Co films have been studied, where the ELS intensity shows a maximum at a critical field (H-erit) between the in-plane and out-of-plane magnetization. We find that the maximum ELS intensity increases significantly with increasing Cc thickness, where the strong PMA realizes H-erit in such thicker Co films. (C) 2002 Elsevier Science B.V. All rights reserved.
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收藏
页码：386 / 388
页数：3
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