Kinetics and concentration of active particles in nonequilibrium low temperature methane plasma

被引:4
作者
Semenova, O. A. [1 ]
Efremov, A. M. [1 ]
Barinov, S. M. [1 ]
Svettsov, V. I. [1 ]
机构
[1] Ivanovo State Univ Chem & Technol, Ivanovo, Russia
关键词
CHEMICAL-VAPOR-DEPOSITION; FILMS; PARAMETERS;
D O I
10.1134/S0018151X14020205
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the stationary parameters and the composition of the DC glow discharge plasma (p = 40-200 Pa, i = 30-70 mA) in methane by means of the probe technique and numerical simulation. We have obtained data on the reduced strength of the electric field, on the rate constants of the processes under electron impact, and on the stationary concentrations of the neutral and charged particles.
引用
收藏
页码:348 / 354
页数:7
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