The contribution of Cr and Mo to the passivation of Ni22Cr and Ni22Cr10Mo alloys in sulfuric acid

被引:54
作者
Li, Xuejie [1 ]
Henderson, Jeffrey D. [2 ]
Filice, Fraser P. [2 ]
Zagidulin, Dmitrij [2 ]
Biesinger, Mark C. [2 ,3 ]
Sun, Fan [1 ]
Qian, Bingnan [1 ]
Shoesmith, David W. [2 ,3 ]
Noel, James J. [2 ,3 ]
Ogle, Kevin [1 ]
机构
[1] PSL Univ, Chim ParisTech, CNR, IRCP, F-75005 Paris, France
[2] Western Univ, Dept Chem, London, ON N6A 5B7, Canada
[3] Western Univ, Surface Sci Western, London, ON N6G 0J3, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
Passivation; Ni alloys; Mo; Kinetics; Alloys;
D O I
10.1016/j.corsci.2020.109015
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The beneficial effects of Mo on passive film formation were investigated for Ni22Cr10Mo with AESEC and XPS by comparison with Ni22Cr and pure Ni and Mo. Both spontaneous (E approximate to -0.2 V-SCE) and anodic passivation (E = 0.3 V-SCE) showed Cr surface accumulation, while significant Mo accumulation (as Mo(IV)) only occurred during spontaneous passivation with a markedly reduced open circuit corrosion rate as a consequence. Mo facilitated the active to passive transition in the low potential domain probably by favoring the oxidation of Cr to Cr2O3 over Cr(OH)(3). At higher potential, Mo dissolved as Mo(VI) and did not accumulate in the film.
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页数:13
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