Atomic processes in self-diffusion of Ni surfaces

被引：31

作者：

Fu, TY ^{[1
]}

Tsong, TT

机构：

[1] Acad Sinica, Inst Phys, Taipei 11529, Taiwan

[2] Natl Taiwan Normal Univ, Dept Phys, Taipei, Taiwan

来源：

SURFACE SCIENCE | 2000年 / 454卷 / 01期

关键词：

adatoms; field ion microscopy; nickel; surface diffusion;

D O I：

10.1016/S0039-6028(00)00095-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Using a field ion microscope, we have probed the diffusion behavior of Ni adatoms on Ni surfaces. Activation barrier heights have been derived to be 0.22+/-0.02 eV and 0.59 +/- 0.03 eV for self-diffusion on Ni(111) and Ni(001), and 0.84+/-0.19 eV for the 'ascending' motion of Ni(111) step edge atoms. From the visit site maps, we have experimentally determined the mechanism of self-diffusion on Ni(001) surfaces to be atomic exchange. (C) 2000 Published by Elsevier Science B.V. All rights reserved.

引用

收藏

页码：571 / 574

页数：4

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