Material properties and interfacial composition of thin films of TiN and Ti(C, N) physically vapour-deposited on iron

被引：4

作者：

Carbucicchio, M

Martini, C

Palombarini, G

Rateo, M

机构：

[1] IST NAZL FIS MAT,I-43100 PARMA,ITALY

[2] UNIV BOLOGNA,IST MET,I-40136 BOLOGNA,ITALY

来源：

PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1997年 / 76卷 / 04期

关键词：

D O I：

10.1080/01418639708241133

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiN and Ti(C, N) films were deposited on both Fe and a tool steel by two different physical vapour deposition techniques: electron-beam hollow cathode discharge and thermal are evaporation. The tribological behaviour of the coated samples were studied under dry-sliding conditions. The differences were explained by taking into account various properties of the films as well as the interfacial phenomena that occur at the film-substrate interface during the deposition step.

引用

页码：669 / 676

页数：8

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