The effect of increasing V content on structure, mechanical and tribological properties of arc evaporated Ti-Al-V-N coatings

被引:59
|
作者
Heiler, M. [1 ]
Kutschej, K. [2 ]
Penoy, M. [3 ]
Michotte, C. [3 ]
Mitterer, C. [2 ]
Kathrein, M. [4 ]
机构
[1] Leoben Forsch GmbH, Mat Ctr, A-8700 Leoben, Austria
[2] Univ Leoben, Dept Phys Met & Mat Testing, Leoben, Austria
[3] CERATIZIT Luxembourg SARL, Mamer, Luxembourg
[4] CERATIZIT Austria GmbH, Reutte, Austria
来源
INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 2009年 / 27卷 / 02期
关键词
Ti-Al-V-N; Cathodic arc evaporation; Tribology; Wear; LOW-FRICTION CONCEPT; BEHAVIOR; TEMPERATURE; PARAMETERS; RESISTANCE; OXIDATION; WEAR;
D O I
10.1016/j.ijrmhm.2008.06.008
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the last years, titanium aluminium vanadium nitride (Ti-Al-V-N) coatings have been introduced as possible candidates for low-friction coatings, based on the formation of vanadium oxide above 550 degrees C. Here we report on the influence of the V content on the mechanical and tribological properties in the temperature range between room temperature (RT) and 500 degrees C. An industrial-scale cathodic arc evaporation facility was used to deposit coatings from powder metallurgically produced Ti33-xAl67Vx targets, with x ranging from 0 to 25 at%. X-ray diffraction experiments displayed a dual-phase structure with hexagonal and face-centred cubic phases for all compositions. However, a decreasing effect of V on the fraction of hexagonal phase was observed. Hardness and Young's modulus increased with increasing V content from 21 to 27.5 GPa and from 250 to 350 GPa, respectively. On the contrary, residual compressive stress decreased with increasing V content from -690 to -330 MPa. Investigations on the wear behaviour at RT revealed decreasing wear coefficients with increasing V content, which is related to reduced tribo-chemical reactions of Ti and the test environment. At 500 degrees C, wear is generally low but increased with increasing V content due to reduced resistance to oxidation. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:502 / 506
页数:5
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