Plasma diagnostics in silane-methane-hydrogen plasmas under pm-Si1-xCx:H deposition conditions:: Correlation with film properties

被引:7
作者
Suendo, V. [1 ]
Cabarrocas, P. Roca i [1 ]
机构
[1] Ecole Polytech, CNRS, UMR 7647, Lab Phys Interfaces & Couches Minces, F-91128 Palaiseau, France
关键词
polymorphous silicon carbon; silicon nanocrystals; H-2 Fulcher alpha; plasma diagnostics; particle formation; photoluminescence;
D O I
10.1016/j.jnoncrysol.2005.12.052
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A systematic study has been done on the formation of nanoparticles in silane-methane-hydrogen plasmas and their effect on material properties. By increasing the total pressure we cover three phases of particle growth: nanocrystals nucleation and accumulation, agglomeration, and powder formation. The presence of particles in the plasma is detected from the evolution of the discharge electrical parameters such as the self-bias (V-DC) on the radio-frequency electrode and the peak-to-peak RF voltage (V-PP). Interestingly, optical emission spectroscopy measurements show that the presence of particles has a strong effect on the hydrogen emission bands. Indeed, while H-alpha emission is dominant at low pressure in a powder free discharge, the formation of particles leads to an intense H-2 Fulcher alpha band. Moreover the ratio I-Fulcher/I-H alpha provides a clear signature of the transition from nucleation to agglomeration regimes, thus providing an easy way of characterizing the plasma regime. The changes in the deposition regime are also reflected on the film properties, in particular their photoluminescence characteristics. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:959 / 963
页数:5
相关论文
共 19 条
[1]   CHARACTERISTICS OF A DUSTY NONTHERMAL PLASMA FROM A PARTICLE-IN-CELL MONTE-CARLO SIMULATION [J].
BOEUF, JP .
PHYSICAL REVIEW A, 1992, 46 (12) :7910-7922
[2]   STUDY OF VOLUME AND SURFACE PROCESSES IN LOW-PRESSURE RADIO-FREQUENCY PLASMA REACTORS BY PULSED EXCITATION METHODS .1. HYDROGEN ARGON PLASMA [J].
BOUCHOULE, A ;
RANSON, P .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (02) :317-326
[3]  
BOUCHOULE A, 1999, DUSTY PLASMA, P162
[4]   Polymorphous silicon thin films produced in dusty plasmas:: application to solar cells [J].
Cabarrocas, PRI ;
Chaâbane, N ;
Kharchenko, AV ;
Tchakarov, S .
PLASMA PHYSICS AND CONTROLLED FUSION, 2004, 46 :B235-B243
[5]   Trapping of plasma produced nanocrystalline Si particles on a low temperature substrate [J].
Chadbane, N ;
Cabarrocas, PRI ;
Vach, H .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 338 :51-55
[6]   Temperature dependence of the optical functions of amorphous silicon-based materials: application to in situ temperature measurements by spectroscopic ellipsometry [J].
Daineka, D ;
Suendo, V ;
Cabarrocas, PRI .
THIN SOLID FILMS, 2004, 468 (1-2) :298-302
[7]   Analysis of particulates generated in a radiofrequency methane plasma by laser light scattering and optical spectroscopy [J].
Géraud-Grenier, I ;
Massereau-Guilbaud, V ;
Plain, A .
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 1999, 8 (01) :53-59
[8]   Validation of actinometry for estimating relative hydrogen atom densities and electron energy evolution in plasma assisted diamond deposition reactors [J].
Gicquel, A ;
Chenevier, M ;
Hassouni, K ;
Tserepi, A ;
Dubus, M .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (12) :7504-7521
[9]   Influence of surface states on the photoluminescence from silicon nanostructures [J].
Islam, MN ;
Kumar, S .
JOURNAL OF APPLIED PHYSICS, 2003, 93 (03) :1753-1759
[10]   Plasma studies under polymorphous silicon deposition conditions [J].
Kharchenko, AV ;
Suendo, V ;
Cabarrocas, PRI .
THIN SOLID FILMS, 2003, 427 (1-2) :236-240