Direct measurement of graphene adhesion on silicon surface by intercalation of nanoparticles

被引：166

作者：

Zong, Zong ^{[1
]}

Chen, Chia-Ling ^{[1
]}

Dokmeci, Mehmet R. ^{[1
]}

Wan, Kai-tak ^{[1
]}

机构：

[1] Northeastern Univ, Boston, MA 02115 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2010年 / 107卷 / 02期

基金：

美国国家科学基金会;

关键词：

adhesion; elemental semiconductors; graphene; multilayers; nanoparticles; scanning electron microscopy; silicon; FILMS; SHEETS;

D O I：

10.1063/1.3294960

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report a technique to characterize adhesion of monolayered/multilayered graphene sheets on silicon wafer. Nanoparticles trapped at graphene-silicon interface act as point wedges to support axisymmetric blisters. Local adhesion strength is found by measuring the particle height and blister radius using a scanning electron microscope. Adhesion energy of the typical graphene-silicon interface is measured to be 151 +/- 28 mJ/m(2). The proposed method and our measurements provide insights in fabrication and reliability of microelectromechanical/nanoelectromechanical systems.

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