Degradation of sulphamethazine by means of an improved photo-Fenton process involving a hydrogen peroxide systematic dosage

被引:6
|
作者
Yamal-Turbay, Evelyn [1 ]
Perez Gonzalez, Lydia [1 ]
Graells, Moises [1 ]
Perez-Moya, Montserrat [1 ]
机构
[1] Univ Politecn Cataluna, Dept Engn Quim, EUETIB, Barcelona 08036, Spain
关键词
emerging contaminants; sulphamethazine; photo-Fenton process; hydrogen peroxide dosage; ADVANCED OXIDATION PROCESSES; UV/H2O2 ADVANCED OXIDATION; WATER; PHARMACEUTICALS; PHOTODEGRADATION; REMOVAL; SULFAMETHOXAZOLE; PRODUCTS;
D O I
10.1080/09593330.2014.880516
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Despite being acknowledged as an emerging contaminant, sulphamethazine (SMT) degradation has received scarce attention in the advanced oxidation processes field. Thus, this work addresses the degradation of SMT in water solutions (12L of 25mgL(-1) samples) by means of a photo-Fenton process and a systematic H2O2 dosage protocol that enhances its performance. A conventional photo-Fenton process led to 86% mineralization after 120min treatment when adding the Fenton reactants at once (initial concentrations were 10mgL(-1) Fe(II) and 200mgL(-1)H(2)O(2)). Conversely, the process achieved the total mineralization of the samples in less than 75min when the same amount of H2O2 was continuously dosed according to a conveniently tuned dosage protocol. In both cases, total SMT degradation was achieved within 10min. Hence, this work's aim is to determine the efficient dosage conditions of H2O2. The results show that a significant improvement of the photo-Fenton mineralization of SMT solutions is possible by adjusting the dosage of H2O2.
引用
收藏
页码:1695 / 1701
页数:7
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