Observation of multiple Er3+ sites in Er-implanted GaN by site-selective photoluminescence excitation spectroscopy

被引:77
作者
Kim, S
Rhee, SJ
Turnbull, DA
Reuter, EE
Li, X
Coleman, JJ
Bishop, SG
机构
[1] Microelectronics Laboratory, Univ. Illinois at Urbana-Champaign, Urbana
关键词
D O I
10.1063/1.119507
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopies have been carried out at 6 K on the 1540 nm I-4(13/2) --> I-4(15/2) emission of Er3+ in Er-implanted films of GaN grown by metalorganic chemical vapor deposition. The PLE spectra exhibit several broad below-gap absorption bands, which excite three distinct site-selective Er3+ PL spectra. The excitation of two of the site-selective Er PL bands involves optical absorption by defects or background impurities, rather than direct intra-f shell absorption, with subsequent nonradiative transfer of the energy to nearby Er3+ luminescence centers. The characteristics of the PLE spectrum of the third site-selective PL band suggest that an exciton bound at an Er-related trap is involved in the excitation mechanism, (C) 1997 American Institute of Physics.
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页码:231 / 233
页数:3
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