Electro-absorption modulation in GeSn alloys for wide-spectrum mid-infrared applications

Silicon-based electronic-photonic integrated circuits, which are compatible with state-of-the-art complementary metal-oxide-semiconductor processes, offer promising opportunities for on-chip mid-infrared photonic systems. However, the lack of efficient mid-infrared optical modulators on silicon hinders the utilization of such systems. Here, we demonstrate the Franz-Keldysh effect in GeSn alloys and achieve mid-infrared electro-absorption optical modulation using GeSn heterostructures on silicon. Our experimental and theoretical results verify that the direct bandgap energy of GeSn can be widely tuned by varying the Sn content, thereby realizing wavelength-tunable optical modulation in the mid-infrared range with a figure-of-merit greater than 1.5 and a broadband operating range greater than 140 nm. In contrast to conventional silicon-photonic modulators based on the plasma dispersion effect, our GeSn heterostructure demonstrates practical and effective Franz-Keldysh mid-infrared optical modulation on silicon, helping to unlock the potential of electronic-photonic integrated circuits in a wide range of applications. Silicon-based electronic-photonic integrated circuits are promising for various applications, but their mid-infrared optical modulation is elusive. Here, tunable mid-infrared electro-absorption modulation, with broadband operation range >140 nm, is achieved in GeSn alloys on Si by controlling the Sn content.