Research on the photoluminescence of spectral broadening by rapid thermal annealing on InAs/GaAs quantum dots

被引:1
作者
Ning, Dandan [1 ,2 ,3 ]
Chen, Yanan [2 ,3 ,4 ]
Li, Xinkun [5 ]
Liang, Dechun [5 ]
Ma, Shufang [1 ]
Jin, Peng [2 ,3 ,4 ]
Wang, Zhanguo [2 ,3 ,4 ]
机构
[1] Shaanxi Univ Sci & Technol, Inst Atom & Mol Sci, Xian 710021, Peoples R China
[2] Chinese Acad Sci, Key Lab Semicond Mat Sci, Inst Semicond, Beijing 100083, Peoples R China
[3] Chinese Acad Sci, Beijing Key Lab Low Dimens Semicond Mat & Devices, Inst Semicond, Beijing 100083, Peoples R China
[4] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
[5] Beijing Inst Aerosp Control Instruments, Beijing 100039, Peoples R China
基金
中国国家自然科学基金;
关键词
quantum dots; rapid thermal annealing; photoluminescence; spectral width;
D O I
10.1088/1674-4926/41/12/122101
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Photoluminescence (PL) test was conducted to investigate the effect of rapid thermal annealing (RTA) on the optical performance of self-assembled InAs/GaAs quantum dots (QDs) at the temperatures of 16 and 300 K. It was found that after RTA treatment, the PL spectrum of the QDs sample had a large blue-shift and significantly broadened at 300 K. Compared with the as-grown InAs QDs sample, the PL spectral width has increased by 44.68 meV in the InAs QDs sample RTA-treated at 800 degrees C. The excitation power-dependent PL measurements showed that the broadening of the PL peaks of the RTA-treated InAs QDs should be related to the emission of the ground state (GS) of different-sized InAs QDs, the InAs wetting layer (WL) and the In0.15Ga0.85As strain reduction layer (SRL) in the epitaxial InAs/GaAs layers.
引用
收藏
页数:6
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