Formation of Metal-Semiconductor Core-shell Nanoparticles Using Electrochemical Atomic Layer Deposition

被引:8
作者
Gu, Chaokang [1 ]
Xu, Hui [2 ]
Park, Minseo [2 ]
Shannon, Curtis [1 ]
机构
[1] Auburn Univ, Dept Chem & Biochem, Auburn, AL 36849 USA
[2] Auburn Univ, Dept Phys, Auburn, AL 36849 USA
来源
ATOMIC LAYER DEPOSITION APPLICATIONS 4 | 2008年 / 16卷 / 04期
关键词
D O I
10.1149/1.2979993
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We report the synthesis of CuI coated and CdS coated Au core-shell nanoparticle films using electrochemical atomic layer deposition (EC-ALD). Au nanoparticle thin films were prepared on glassy carbon supports by depositing alternating layers of poly(diallyl dimethylammonium)-stabilized Au nanoparticles and CoP2W17O618- polyoxometallate interlayers. CuI was deposited onto the surface of Au nanoparticles using electrochemical atomic layer epitaxy, while CdS films were grown by an atom-by-atom co-deposition technique. The semiconductor-coated nanoparticles were characterized by electrochemistry, photoluminescence spectroscopy, and Raman spectroscopy. Our results indicate that the semiconductors are deposited onto the Au nanoparticles surface by surface limited electrochemical reactions.
引用
收藏
页码:181 / +
页数:4
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