Effect of purity on the fabrication of Al micro/thin-materials by utilizing electromigration

被引：12

作者：

Lu, Yebo ^{[1
,2
]}

Saka, Masumi ^{[1
]}

机构：

[1] Tohoku Univ, Dept Nanomech, Aoba Ku, Sendai, Miyagi 9808579, Japan

[2] E China Univ Sci & Technol, Sch Mech & Power Engn, Shanghai 200237, Peoples R China

来源：

MATERIALS LETTERS | 2009年 / 63卷 / 27期

关键词：

Micro/thin-materials; Electromigration; Purity; Activation energy; NANOWIRES; CU; MICROSPHERES; GROWTH; DAMAGE; FILMS; METAL;

D O I：

10.1016/j.matlet.2009.07.055

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of purity on the fabrication of At micro/thin-materials (MTMs) by utilizing electromigration (EM) has been investigated. The samples that were used to fabricate the At MTMs were passivated polycrystalline Al lines incorporating a slit and small holes at the anode end of each sample. At materials of different purity, 99% (2 N) and 99.99% (4 N), were used, and it was found that the atomic flux of the 2 N sample was significantly larger than that of the 4 N sample, leading to the enhanced fabrication of A] MTMs due to EM under the same experimental conditions, which turned out to be related to a decrease in the activation energy for grain boundary diffusion. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：2294 / 2296

页数：3

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